Translation examples
Nykyisin käytössä olevilla optisilla litografiatyökaluilla käyttämällä syvää ultraviolettivaloa (DUV, deep ultraviolet) aallonpituuksilla 248:sta 193:een nanometriin päästään 50 nm viivanpaksuuteen.
Current state-of-the-art lithography tools use deep ultraviolet (DUV) light from the KrF and ArF excimer lasers with wavelengths of 248 and 193 nanometers (the dominant lithography technology today is thus also called "excimer laser lithography"), which has enabled transistor feature sizes to shrink below 45 nanometers.
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